Simultaneous Approach to Model Building and Process Design Using Experimental Design: Application to Chemical Vapor Deposition

Simultaneous Approach to Model Building and Process Design Using Experimental Design: Application to Chemical Vapor Deposition

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This new experimental design methodology is tested first on simulated data. The first simulation fits a model to data generated by the modified Himmelblau function (MHF). The second simulation fits multiple models to data generated to simulate a film growth process. In both simulations the grid algorithm leads to improved prediction at the optimal point and better sampling of the region around the optimal point.Both the inlet and the outlet tubing have a manual valve on them to either open up or close off the evaporator from the ... the flow manifold, everything else in the upstream section is housed inside a hot air convection oven [Grieve NB-350] toanbsp;...


Title:Simultaneous Approach to Model Building and Process Design Using Experimental Design: Application to Chemical Vapor Deposition
Author: Paul J. Wissmann
Publisher:ProQuest - 2008
ISBN-13:

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